Chemical Vapor Deposition system especially designed for diamond film growth, featuring bias voltage (1000 VDC, 200 mA), a graphite heater that can reach up to 1200 oC, independent control of the substrate and filament temperatures and of the substrate-to-filament distance, and independent control of the gas flow, gas composition and total pressure.
In situ spectroscopic ellipsometer model UVISEL DH10 from Instruments S.A. This ellipsometer serves to monitor the growing material in real time, thus enabling efficient control of film properties. The ellipsometer is also critical in the characterization of surface variations resulting from post-fabrication gas treatments, and in the determination of the correct timing of the various material processing steps involved in the fabrication of the proposed materials.
Two-color optical pyrometer to monitor the filament and substrate surface temperatures.
Gas feeding assembly especially designed for diamond growth. High purity methane and hydrogen are fed into the chamber using normally-closed electronic gas meter/controllers. The hydrogen gas remains in contact with the filament for a longer time, thus increasing the production of atomic hydrogen. The methane remains separated from the filament and directed toward the substrate. The whole gas feeding assembly is mounted on a linear motion manipulator that allows fine remote control of the distance from the filament to the substrate.
Step-Scan Fourier Transform Infrared Spectrometer (FTIR) from Bruker (Model IFS 66/S)
Photoacoustic accesory for the FTIR that enables to perform non-destructive IR spectroscopy of solid materials. Current-Voltage (I-V) Measurements set-up including a Keithley 6517A electrometer capable of measuring currents down to 10 pA. Coherent Nd:YAG laser, 1-100 Hz variable, FWHM = 6 ns, and accessory optical components to produce the second (532 nm), triple (355 nm), fourth (266 nm), and ninth (118 nm) harmonics.
Tektronics 400 MHz Digital Scope.
Arc-discharge deposition system (including bell jar, pumps, pressure control, and high-current power supply Lincoln DC-400 that can give up to 600 A) .